The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Nov. 26, 2008
Jinqiu Zhang, Fremont, CA (US);
Tsung Yuan Chen, San Jose, CA (US);
Steven C. Rudy, San Jose, CA (US);
Jinqiu Zhang, Fremont, CA (US);
Tsung Yuan Chen, San Jose, CA (US);
Steven C. Rudy, San Jose, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing a stop layer; providing an insulating layer over the stop layer; forming a pole trench in the insulating layer by performing a reactive ion etching (RIE) process in the insulating layer over the stop layer; forming an electronic lapping guide (ELG) in the insulating layer by performing the RIE process in the insulating layer over the stop layer; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.