The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
May. 19, 2006
Hajime Yamamoto, Kumagaya, JP;
Tohru Isogami, Tsukuba, JP;
Kazuaki Suzuki, Tokyo, JP;
Noriyuki Hirayanagi, Tokyo, JP;
Hajime Yamamoto, Kumagaya, JP;
Tohru Isogami, Tsukuba, JP;
Kazuaki Suzuki, Tokyo, JP;
Noriyuki Hirayanagi, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Exposure apparatus are disclosed that can control, to high precision, exposure doses on a photosensitive substrate of a mask pattern defined on a reflective mask as the pattern is being exposed on the substrate using a projection-optical system. An exemplary apparatus includes a first illumination sensor for detecting light that is incident on a reflective mask from an illumination system and a second illumination sensor for detecting light that has propagated from the illumination system to a reference reflective surface on the reflective mask, reflected from the reference reflective surface, and arrived at an image surface of the projection-optical system. Calibration of the first sensor is performed based on detection data obtained by the first sensor and detection data obtained by the second sensor. Exposure of the substrate is controlled based on the detection data obtained by the calibrated first sensor.