The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2011

Filed:

Apr. 21, 2006
Applicants:

Dean C. Webster, Fargo, ND (US);

Zhigang Chen, Fargo, ND (US);

Neena Ravindran, Fargo, ND (US);

Inventors:

Dean C. Webster, Fargo, ND (US);

Zhigang Chen, Fargo, ND (US);

Neena Ravindran, Fargo, ND (US);

Assignee:

NDSU Research Foundation, Fargo, ND (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 303/00 (2006.01); A01N 43/20 (2006.01); A01N 43/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are coating formulations that include a copolyester and a vinyl ether in which the copolyester is produced by copolymerizing a monomer composition that includes a fused aromatic diacid monomer, an unsaturated diacid monomer, and a polyol. Also disclosed are methods for producing a laser-ablatable film on a surface of a substrate. The method includes coating the substrate with a coating formulation that includes a copolyester and a vinyl ether and polymerizing the coating formulation. The copolyester includes a fused aromatic moiety covalently bonded therein. Novel radiation curable sensitizers that can be used in the preparation of radiation curable polymer films having improved laser ablation properties are also described.


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