The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Jun. 27, 2005
Masahiko Kubota, Tokyo, JP;
Takumi Suzuki, Yokohama, JP;
Tamaki Sato, Kawasaki, JP;
Ryoji Kanri, Zushi, JP;
Maki Hatta, Tokyo, JP;
Kazuhiro Asai, Atsugi, JP;
Shoji Shiba, Kawasaki, JP;
Hiroe Ishikura, Kawasaki, JP;
Akihiko Okano, Yokohama, JP;
Masahiko Kubota, Tokyo, JP;
Takumi Suzuki, Yokohama, JP;
Tamaki Sato, Kawasaki, JP;
Ryoji Kanri, Zushi, JP;
Maki Hatta, Tokyo, JP;
Kazuhiro Asai, Atsugi, JP;
Shoji Shiba, Kawasaki, JP;
Hiroe Ishikura, Kawasaki, JP;
Akihiko Okano, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.