The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Sep. 26, 2007
Cheng Yang, Pittsford, NY (US);
Lyn M. Irving, Rochester, NY (US);
David H. Levy, Rochester, NY (US);
Peter J. Cowdery-corvan, Webster, NY (US);
Diane C. Freeman, Pittsford, NY (US);
Cheng Yang, Pittsford, NY (US);
Lyn M. Irving, Rochester, NY (US);
David H. Levy, Rochester, NY (US);
Peter J. Cowdery-Corvan, Webster, NY (US);
Diane C. Freeman, Pittsford, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organosiloxane compound; and patterning the deposition inhibitor material either after or simultaneously with or introducing applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.