The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Nov. 18, 2008
Masahiro Yamamoto, Osaka, JP;
Takeshi Koiwasaki, Osaka, JP;
Isao Muragishi, Osaka, JP;
Hitoshi Yamanishi, Osaka, JP;
Masahiro Yamamoto, Osaka, JP;
Takeshi Koiwasaki, Osaka, JP;
Isao Muragishi, Osaka, JP;
Hitoshi Yamanishi, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
The present invention is to provide a sputtering apparatus and a sputtering method, specifically, a magnetron sputtering apparatus having a magnetron electrode capable of generating plasma in a wide region near the surface of a target, and a sputtering method using the apparatus. Thereby, a magnetic field shape enabling to generate plasma in a wide region near the surface of a target is realized, the use efficiency of the target material is increased, and dusts and abnormal electric discharges may be prevented. Magnetic circuitof a magnetron electrode is set as 'magnetic circuitin which center perpendicular magnet, inside parallel magnet, outside parallel magnet, and perimeter perpendicular magnetare arranged' from the central part of targettoward the perimeter part, and inside parallel magnetis brought close to target