The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Dec. 22, 2005
Gary S. Selwyn, Los Alamos, NM (US);
Hans W. Herrmann, Los Alamos, NM (US);
Matthew R. Barnes, Santa Fe, NM (US);
Gary S. Selwyn, Los Alamos, NM (US);
Hans W. Herrmann, Los Alamos, NM (US);
Matthew R. Barnes, Santa Fe, NM (US);
APJeT, Inc., Sante Fe, NM (US);
Abstract
An apparatus and method for generating gas-phase active chemical species suitable for selectively processing one side of a textile or nonwoven material are described. Processing includes etching or stripping coatings, as examples. A low-temperature plasma is used to produce an ionized gas containing radical species, atoms, ions, and electrons, some of which are suitable for removing or modifying the coating. For the purposes of the present invention, the plasma may be generated in a vacuum, or at atmospheric pressure. Dielectric-barrier discharges, atmospheric-pressure plasma jets, micro hollow-cathode discharges, coronas, or plasmas produced by a microwave discharge or laser-supplied energy may be used to generate the required species.