The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2011

Filed:

May. 27, 2010
Applicants:

Tetsuya Nakanishi, Kanagawa, JP;

Masashi Onishi, Kanagawa, JP;

Tomoyuki Yokokawa, Kanagawa, JP;

Masaaki Hirano, Kanagawa, JP;

Nobuyuki Taira, Kanagawa, JP;

Inventors:

Tetsuya Nakanishi, Kanagawa, JP;

Masashi Onishi, Kanagawa, JP;

Tomoyuki Yokokawa, Kanagawa, JP;

Masaaki Hirano, Kanagawa, JP;

Nobuyuki Taira, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 37/07 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a glass processing method according to the invention, in the case of performing chemical vapor deposition or diameter shrinkage of a substrate glass tube G by relatively moving a heating furnacecomprising a heating elementfor annularly enclosing the circumference of the substrate glass tube in a longitudinal direction of the substrate glass tube G with respect to the substrate glass tube G in which an outer diameter is 30 mm or more and a wall thickness is 3 mm or more and is less than 15 mm and an ovality of the outer diameter is 1.0% or less using a glass processing apparatus, a temperature of at least one of the heating elementand the substrate glass tube G is measured and the amount of heat generation of the heating elementis adjusted based on the measured temperature.


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