The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Jan. 05, 2009
Azalia Krasnoperova, Mahwah, NJ (US);
Ian P Stobert, Hopewell Junction, NY (US);
Klaus Herold, Poughquag, NY (US);
Azalia Krasnoperova, Mahwah, NJ (US);
Ian P Stobert, Hopewell Junction, NY (US);
Klaus Herold, Poughquag, NY (US);
International Business Machines Corporation, Armonk, NY (US);
InfineonTechnologies North America Corporation, Milpitas, CA (US);
Abstract
Embodiments of the present invention provide a method for making mask shape adjustment The method includes creating a first mask shape; identifying one or more mask segments of the first mask shape as candidate mask segments of needing segment adjustment; applying an optical proximity correction (OPC) process to the first mask shape, the OPC process identifying at least one of the candidate mask segments as a constrained mask segment; applying a rotational adjustment to the constrained mask segment; and creating a second mask shape having the constrained mask segment being rotationally adjusted. A system and a machine-readable medium for performing the above method are also provided.