The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

Feb. 15, 2007
Applicants:

Leslie A. Wahrmund, Kingwood, TX (US);

Kenneth E. Green, Houston, TX (US);

Dmitriy A. Pavlov, The Woodlands, TX (US);

Leonard J. Srnka, Bellaire, TX (US);

Inventors:

Leslie A. Wahrmund, Kingwood, TX (US);

Kenneth E. Green, Houston, TX (US);

Dmitriy A. Pavlov, The Woodlands, TX (US);

Leonard J. Srnka, Bellaire, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06G 7/48 (2006.01); G06F 7/60 (2006.01); G06F 17/10 (2006.01); G01V 1/40 (2006.01); G01V 3/18 (2006.01); G01V 5/04 (2006.01); G01V 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method for generating a three-dimensional resistivity data volume for a subsurface region from an initial resistivity model and measured electromagnetic field data from an electromagnetic survey of the region, where the initial resistivity model is preferably obtained by performing multiple ID inversions of the measured data []. The resulting resistivity depth profiles are then registered at proper 3D positions []. The 3D electromagnetic response is simulated [] assuming the resistivity structure is given by the initial resistivity model. The measured electromagnetic field data volume is scaled by the simulated results [] and the ratios are registered at proper 3D positions [] producing a ratio data volume []. A 3D resistivity volume is then generated by multiplying the initial resistivity volume by the ratio data volume (or some function of it), location-by location []. A related method emphasizes deeper resistive anomalies over masking effects of shallow anomalies.


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