The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Oct. 20, 2009
Cedric X. Yu, Clarksville, MD (US);
Shuang Luan, Albuquerque, NM (US);
Danny Z. Chen, Granger, IN (US);
Matthew A. Earl, Crownsville, MD (US);
Chao Wang, Columbia, MD (US);
Cedric X. Yu, Clarksville, MD (US);
Shuang Luan, Albuquerque, NM (US);
Danny Z. Chen, Granger, IN (US);
Matthew A. Earl, Crownsville, MD (US);
Chao Wang, Columbia, MD (US);
University of Maryland, Baltimore, Baltimore, MD (US);
Abstract
Provided herein are methods and systems for designing a radiation treatment for a subject using single arc dose painting. The methods and systems comprise an algorithm or a computer-readable product having the same, to plan the radiation treatment. The algorithm converts pairs of multiple leaf collimation (MLC) leaves to sets of leaf aperture sequences that form a shortest path single arc thereof where the pairs of MLC leaves each aligned to an intensity profile of densely-spaced radiation beams, and connects each single arc of leaf apertures to form a final treatment single arc. Also provided is a method for irradiating a tumor in a subject using single arc dose painting.