The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Mar. 21, 2007
Shide Cheng, Fremont, CA (US);
Zhu Feng, Pleasanton, CA (US);
Ellis T. Cha, San Ramon, CA (US);
SAE Magnetics (HK) Ltd., Shatin, N.T., HK;
Abstract
A protective bilayer on a magnetic read/write head or magnetic disk is formed as an adhesion enhancing and corrosion resistant underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is a transition metal oxynitride, having the general formula MeON, where Me represents a single element or an alloy of the following transition metal elements: Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W, here x can be within the range between 0 and 3 and y is in the range between approximately 0 and 2. Adjusting the values of x and y contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Methods of forming the adhesion layer, include reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.