The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

Jan. 23, 2008
Applicants:

Yong Min Ha, Gumi, KR;

Hun Jeoung, Chilgok-Gun, KR;

Jeong Woo Jang, Gyeongsangbuk-Do, KR;

Inventors:

Yong Min Ha, Gumi, KR;

Hun Jeoung, Chilgok-Gun, KR;

Jeong Woo Jang, Gyeongsangbuk-Do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01);
U.S. Cl.
CPC ...
Abstract

An LCD is fabricated using a diffraction mask with transmissive, semi-transmissive, and opaque regions. The semi-transmissive region permits formation of a transmission, reflection, or pixel electrode, depending on the type of LCD being fabricated, using the same masking process as that to produce contact holes in an insulating film and a conductive layer. Photoresist exposed through the semi-transmissive region is partially removed during developing that completely removes photoresist in the transmissive or opaque region. The contact holes are formed in the region in which the photoresist is completely removed, the photoresist and underlying conductive layer in the semi-transmissive region are then removed, and the remaining photoresist is stripped.


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