The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Dec. 04, 2008
George V. Eleftheriades, Scarborough, CA;
George V. Eleftheriades, Scarborough, CA;
Other;
Abstract
A method and apparatus for near-field focusing of an incident wave, over a range of frequencies from microwaves to optical frequencies, into a sub-wavelength spot having a peak-to-null beamwidth of λ/10. The screen may be made out of closely spaced, unequal slots cut on a metallic sheet. Nano-scale focusing capability may be achieved with a simple structure of three slots on a metallic sheet, which can be readily implemented using current nanofabrication technologies. Unlike negative-refractive-index focusing implementations, this 'meta-screen' does not suffer from image degradation when losses are introduced and is easily scalable from microwave to Terahertz frequencies and beyond. The slotted geometry is designed using a theory of shifted beams to determine the necessary weighting factors for each slot element, which are then converted to appropriate slot dimensions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile