The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Jan. 03, 2008
Kuan-neng Chen, White Plains, NY (US);
John Christopher Arnold, North Chatham, NY (US);
Niranjana Ruiz, White Plains, NY (US);
Kuan-Neng Chen, White Plains, NY (US);
John Christopher Arnold, North Chatham, NY (US);
Niranjana Ruiz, White Plains, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A feature is formed in an integrated circuit by providing one or more layers to be patterned, providing a first layer overlying the one or more layers to be patterned, and providing a second layer overlying the first layer. The second layer is patterned to form a raised feature with one or more sidewalls. Subsequently, the first layer is processed such that components of the first layer deposit on the one or more sidewalls of the raised feature to form a mask. The mask is used to pattern the one or more layers to be patterned.