The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

Nov. 17, 2010
Applicants:

Masahiko Suzuki, Wakayama, JP;

Yuichi Homma, Wakayama, JP;

Yukiko Yamawaki, Wakayama, JP;

Inventors:

Masahiko Suzuki, Wakayama, JP;

Yuichi Homma, Wakayama, JP;

Yukiko Yamawaki, Wakayama, JP;

Assignee:

Kao Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/00 (2006.01); B24D 11/00 (2006.01); B24D 18/00 (2006.01); B24D 3/02 (2006.01); C09K 3/14 (2006.01); C09C 1/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as the following formulae (II) to (IV). Methoxypolyethylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (I), stearyl methacrylate etc. are used as monomers for forming the constitutional unit of the formula (II), polypropylene glycol methacrylate etc. are used as monomers for forming the constitutional unit of the formula (III), and styrene etc. are used as monomers for forming the constitutional unit of the formula (IV).


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