The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Aug. 26, 2010
Chung-ho Huang, San Jose, CA (US);
Hae-pyng Jea, Palo Alto, CA (US);
Tung Hsu, Fremont, CA (US);
Jackie Seto, Mountain View, CA (US);
Chung-Ho Huang, San Jose, CA (US);
Hae-Pyng Jea, Palo Alto, CA (US);
Tung Hsu, Fremont, CA (US);
Jackie Seto, Mountain View, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A system for facilitating plasma processing tool component management across plurality of tools is provided. The system includes means for receiving first component data for first plurality of components, including identification and usage history for a first plurality of components, at first database associated with first tool. The system also includes means for receiving second component data for second plurality of components at second database associated with second tool, which is different from first tool. The system further includes means for synchronizing first and second component data with third database. The synchronizing includes synchronizing between third database and at least one of first and second database rules that govern usage of at least one component of first and second plurality of components. The third database is coupled to exchange data with plurality of tools. The system yet also includes means for obtaining information, using rules and usage history data about given component prior to performing one of replacement, analysis, and maintenance.