The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Jul. 03, 2008
Method for fabricating an integrated circuit including memory element with spatially stable material
Dieter Andres, Munich, DE;
Thomas Happ, Dresden, DE;
Petra Majewski, Munich, DE;
Bernhard Ruf, Sauerlach, DE;
Dieter Andres, Munich, DE;
Thomas Happ, Dresden, DE;
Petra Majewski, Munich, DE;
Bernhard Ruf, Sauerlach, DE;
Qimonda AG, Munich, DE;
Abstract
A method for fabricating an integrated circuit, the method comprises forming a first electrode, depositing resistance changing material over the first electrode, the resistance changing material having an active zone for switching the resistance of the resistance changing material and an inactive zone, and forming a second electrode over the resistance changing material. The chemical composition of the resistance changing material in the active zone differs from the chemical composition of the resistance changing material in the inactive zone.