The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2011

Filed:

Mar. 16, 2008
Applicants:

Peter Gefter, South San Francisco, CA (US);

Lawrence Levit, Alamo, CA (US);

Leslie Partridge, Davis, CA (US);

Scott Gehlke, Berkeley, CA (US);

Inventors:

Peter Gefter, South San Francisco, CA (US);

Lawrence Levit, Alamo, CA (US);

Leslie Partridge, Davis, CA (US);

Scott Gehlke, Berkeley, CA (US);

Assignee:

Ion Systems, Inc., Alameda, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05F 3/00 (2006.01); H05F 3/04 (2006.01); H01T 23/00 (2006.01); H01G 7/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A low maintenance AC gas-flow driven static neutralizer, comprising at least one emitter and at least one reference electrode; a power supply having an output electrically coupled to the emitter(s) and a reference terminal electrically coupled to the reference electrode(s) with the power supply disposed to produce an output waveform that creates ions by corona discharge and to produce an electrical field when this output waveform is applied to the emitter(s); a gas flow source disposed to produce a gas flow across a first region that includes these generated ions and the emitter(s), the gas flow including a flow velocity; and wherein, during a first time duration, the output waveform decreases an electrical force created by the electrical field, enabling the gas flow to carry away from the emitter(s) a contamination particle that may be located within a second region surrounding the emitter(s), and to minimize a likelihood of the contamination particle from accumulating on the emitter(s). The first region may include the second region.


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