The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Feb. 05, 2009
Seung-woo Kim, Yuseong-Gu, KR;
Jong-han Jin, Yuseong-Gu, KR;
Seung-chul Kim, Yuseong-Gu, KR;
In-yong Park, Yuseong-Gu, KR;
Seung-Woo Kim, Yuseong-Gu, KR;
Jong-Han Jin, Yuseong-Gu, KR;
Seung-Chul Kim, Yuseong-Gu, KR;
In-Yong Park, Yuseong-Gu, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Abstract
Disclosed herein is a laptop-size high-order harmonic generation apparatus using near field enhancement. The laptop-size high-order harmonic generation apparatus using near field enhancement includes a femtosecond laser generator, light transfer means for transferring light output from the femtosecond laser generator, micro patterns formed of metallic thin films and configured to have nano-sized apertures for generating near field enhancement when the light output from the light transfer means passes through the micro patterns, a gas supply unit for supplying inert gas to the light when the light transferred through the light transfer means passes through the micro patterns, and a vacuum chamber for accommodating the micro patterns and the gas supply unit under a vacuum atmosphere.