The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Jul. 03, 2008
Gavin R. G. Erry, Malvern, GB;
Paul Harrison, Rio Rancho, NM (US);
Boyd Hunter, Albuquerque, NM (US);
Eugene W. Butler, Albuquerque, NM (US);
Gavin R. G. Erry, Malvern, GB;
Paul Harrison, Rio Rancho, NM (US);
Boyd Hunter, Albuquerque, NM (US);
Eugene W. Butler, Albuquerque, NM (US);
Other;
Abstract
A system, for determining characteristics of a beam wavefront and reshaping such wavefront, including: apparatus for sampling the wavefront curvature and generating outputs; apparatus for reshaping the wavefront; and apparatus for receiving the outputs, proportioning the outputs to match the inputs need to drive controls for the reshaping apparatus, and sending the proportioned outputs to the reshaping apparatus. The reshaping apparatus is, preferably, a deformable mirror. The sampling apparatus includes a distorted grating. The method includes: positioning the sampling apparatus in the bean path; positioning a reshaping apparatus in the beam path; sampling the curvature of the wavefront and generating outputs representative of the curvature thereof; sending the generated outputs to the proportioning apparatus; proportioning the outputs to match the inputs needed to drive the controls of the reshaping apparatus; and sending the proportioned outputs to the reshaping apparatus to change the shape thereof.