The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8009272 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 30, 2011

Filed:

May. 12, 2008
Applicant:

Akinori Ohkubo, Utsunomiya, JP;

Inventor:

Akinori Ohkubo, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system.


Find Patent Forward Citations

Ohkubo, Akinori. (2011). Method and device for image measurement, exposure apparatus, substrate for image measurement, and device manufacturing method (U.S. Patent No. 8009272). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8009272

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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