The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2011

Filed:

Jan. 25, 2007
Applicants:

Katsuhiro Ishida, Yokohama, JP;

Akira Yamamoto, Tokyo, JP;

Ayahito Kojima, Kawasaki, JP;

Shingo Kubo, Kawasaki, JP;

Takashi Shiizaki, Yokohama, JP;

Hirohito Kuriyama, Yokohama, JP;

Inventors:

Katsuhiro Ishida, Yokohama, JP;

Akira Yamamoto, Tokyo, JP;

Ayahito Kojima, Kawasaki, JP;

Shingo Kubo, Kawasaki, JP;

Takashi Shiizaki, Yokohama, JP;

Hirohito Kuriyama, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09G 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the PDP device, for example, two types of SF lighting patterns (A and B modes) are equally divided and arranged in spatially different regions in a field. For example, the patterns are arranged in a zigzag manner in units of pixels. At all lighting steps, existence of an absence of light-on SF which becomes a cause of false contour is permitted only in one mode. Accordingly, a generation rate of absence of light-on SF per field when the modes are combined is low, and the level of false contour can be reduced. Further, the spatial arrangement of each mode is optionally changed among the fields.


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