The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Mar. 21, 2008
Heon Kim, Daejeon, KR;
Sung-ho Chun, Daejeon, KR;
Hye-young Jung, Daejeon, KR;
Dai-seung Choi, Daejeon, KR;
Kyoung-hoon Kim, Daejeon, KR;
Jong-chan Kim, Daejeon, KR;
Heon Kim, Daejeon, KR;
Sung-Ho Chun, Daejeon, KR;
Hye-Young Jung, Daejeon, KR;
Dai-Seung Choi, Daejeon, KR;
Kyoung-Hoon Kim, Daejeon, KR;
Jong-Chan Kim, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a norbornene polymer that comprises a norbornene monomer having a photoreactive functional group, and a method of manufacturing the same. The norbornene polymer comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group. Since the norbornene polymer according to the present invention comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group, a molecular weight is significantly increased while the yield is not reduced during the manufacturing of the polymer. In views of the three dimensional structure, stability is ensured because the polymer has a planar structure in which the photoreactive groups between the molecules are close to each other. Therefore, the distance between the photoreactive groups is reduced, thus increasing the photoreaction rate.