The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2011

Filed:

Oct. 13, 2006
Applicants:

Yasumori Fukushima, Nara, JP;

Yutaka Takafuji, Nara, JP;

Michiko Takei, Nara, JP;

Kazuhide Tomiyasu, Nara, JP;

Inventors:

Yasumori Fukushima, Nara, JP;

Yutaka Takafuji, Nara, JP;

Michiko Takei, Nara, JP;

Kazuhide Tomiyasu, Nara, JP;

Assignee:

Sharp Kabushiki Kaisha, Osaka-Shi Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of the present invention includes a first planarization film formation step of forming, in at least part of a flat portion of the second regions, a first planarization film so as to have a uniform thickness; a second planarization film formation step of forming a second planarization film between the first planarization films to be coplanar with a surface of the first planarization film; a peeling layer formation step of forming a peeling layer by ion implantation of a peeling material into the base layer via the first planarization film or the second planarization film; and a separation step of separating part of the base layer along the peeling layer.


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