The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Oct. 03, 2007
Solomon Assefa, Ossining, NY (US);
Gregory Costrini, Hopewell Junction, NY (US);
Christopher Vincent Jahnes, Upper Saddle River, NJ (US);
Michael J. Rooks, Briarcliff Manor, NY (US);
Jonathan Zanhong Sun, Shrub Oak, NY (US);
Solomon Assefa, Ossining, NY (US);
Gregory Costrini, Hopewell Junction, NY (US);
Christopher Vincent Jahnes, Upper Saddle River, NJ (US);
Michael J. Rooks, Briarcliff Manor, NY (US);
Jonathan Zanhong Sun, Shrub Oak, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A pillar structure that is contacted by a vertical contact is formed in an integrated circuit. A hard mask is formed and utilized to pattern a least a portion of the pillar structure. The hard mask comprises carbon. Subsequently, the hard mask is removed. A conductive material is then deposited in a region previously occupied by the hard mask to form the vertical contact. The hard mask may, for example, comprise diamond-like carbon. The pillar structure may have a width or diameter less than about 100 nanometers.