The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Feb. 19, 2010
Hiroki Yoshikawa, Joetsu, JP;
Yukio Inazuki, Joetsu, JP;
Satoshi Okazaki, Joetsu, JP;
Takashi Haraguchi, Tokyo, JP;
Masahide Iwakata, Tokyo, JP;
Mikio Takagi, Tokyo, JP;
Yuichi Fukushima, Tokyo, JP;
Tadashi Saga, Tokyo, JP;
Hiroki Yoshikawa, Joetsu, JP;
Yukio Inazuki, Joetsu, JP;
Satoshi Okazaki, Joetsu, JP;
Takashi Haraguchi, Tokyo, JP;
Masahide Iwakata, Tokyo, JP;
Mikio Takagi, Tokyo, JP;
Yuichi Fukushima, Tokyo, JP;
Tadashi Saga, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.