The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Mar. 15, 2006
Kazuhiko Nojo, Fujinomiya, JP;
Shuichi Endo, Fujinomiya, JP;
Daisuke Sano, Fujinomiya, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
According to the method and the apparatus for curing a coated film of the present invention, since an ionization radiation is applied after the Oconcentration in the near-surface layer within 1 mm above the surface of the coated film is adjusted to 1000 ppm or lower, the coated film can be sufficiently cured by irradiation of the ionization radiation. In other words, according to the method and the apparatus for curing a coated film of the present invention, since the Oconcentration in a thin near-surface layer on the surface of a coated film is decreased, the coated film can be sufficiently cured by irradiation of an ionization radiation. As a result, the amount of inert gas supplied upon irradiation of an ionization radiation can be reduced, and downsizing and cost reduction of equipment can be achieved.