The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Mar. 28, 2008
Su-mi Lee, Hwaseong-si, KR;
Dong-mok Whang, Yongin-si, KR;
Moon-gyu Lee, Suwon-si, KR;
Yoon-sun Choi, Incheon, KR;
Sun-hwak Woo, Suwon-si, KR;
Su-mi Lee, Hwaseong-si, KR;
Dong-mok Whang, Yongin-si, KR;
Moon-gyu Lee, Suwon-si, KR;
Yoon-sun Choi, Incheon, KR;
Sun-hwak Woo, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
Provided are a method of preparing a nanowire grid polarizer, and a nanowire grid polarizer prepared using the same. The method includes: mixing a surfactant and a silica precursor to prepare a mesoporous film composition; coating the mesoporous film composition on a substrate; aging the coated product to form a silica template composite; removing the surfactant inside the silica template composite to prepare a mesoporous material having channels; and filling the channels of the mesoporous material with metal. The method is suitable for the formation of a nanowire having a stable structure, mass production, and large-area production.