The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Nov. 17, 2008
James H. Dupont, Bowie, AZ (US);
Henri Y. Kim, Tucson, AZ (US);
Travis P. Walter, Tucson, AZ (US);
Raytheon Company, Waltham, MA (US);
Abstract
A high-lethality fragmentation warhead with reduced risk of collateral damage to the warhead launch platform. High lethality is achieved with a forward-firing fragmentation assembly placed in front of the explosive and a side-firing fragmentation assembly placed in a void space in the aft section of the explosive. The risk of collateral damage to the launch platform is reduced by forming the case and explosive containment structures of materials that are pulverized upon detonation of the explosive. This substantially eliminates radial fragments and in particular fragments thrown back towards the platform. Performance may be enhanced by tapering the aft section of the containment structure and explosive to eliminate explosive that does not contribute to the total energy imparted to the forward-firing fragmentation assembly by the pressure wave to create the void space for the side-firing fragmentation assembly. Performance may be further enhanced by forming the end of the explosive and forward-firing fragmentation assembly with largely conformal dome shapes that approximately match the shape of the front of the pressure wave. This both increases the amount of explosive energy delivered to those fragments and serves to expel them in a desirable pattern.