The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2011

Filed:

Feb. 15, 2006
Applicants:

Yuki Nakamura, Hyogo, JP;

Yuji Murashima, Osaka, JP;

Masahiro Yasumi, Osaka, JP;

Kazuki Komaki, Osaka, JP;

Inventors:

Yuki Nakamura, Hyogo, JP;

Yuji Murashima, Osaka, JP;

Masahiro Yasumi, Osaka, JP;

Kazuki Komaki, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 41/22 (2006.01); H04R 17/00 (2006.01); B21D 53/76 (2006.01); B23P 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a production method of a piezoelectric element, an unneeded electric field is prevented from being applied to a piezoelectric thin film layer during the production process, resulting in a high performance piezoelectric element production method. The production method includes a first process for depositing an under electrode layer, a piezoelectric thin film layer and an upper electrode layer successively on a substrate such that the under electrode layer and the upper electrode layer form a short-circuit, a second process, after the first process, for etching including dry etching, the second process commenced while the under electrode layer and the upper electrode layer are short-circuited, a third process, after the second process, for polarizing by applying a voltage across the under electrode layer and the upper electrode layer, a fourth process, after the third process, for individualizing each piezoelectric element.


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