The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
May. 16, 2006
Eoi-young Choi, Seoul, KR;
Seung-bum Suh, Seoul, KR;
Eoi-Young Choi, Seoul, KR;
Seung-Bum Suh, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
Disclosed is a method for puncturing a Low Density Parity Check (LDPC) code that is expressed by a factor graph having a check node and a variable node, connected to each other by an edge, and is decoded by a parity check matrix including a parity part having a single weight-3 column and a dual-diagonal matrix. The method includes selecting 1-step recoverable (1-SR) variable nodes with the highest quality including a variable node mapped to a weight-3 column, and setting a first puncturing priority group using the selected 1-SR variable nodes, selecting k-step recoverable (k-SR) variable nodes with the highest quality in the next step k taking into account the variable nodes selected in the current step, and setting a priority group for each individual step, puncturing an LDPC code mapped to a variable node belonging to a corresponding group according to priority of each group obtained in the preceding steps.