The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Feb. 21, 2007
Masayuki Tanabe, Utsunomiya, JP;
Yutaka Watanabe, Shioya-gun, JP;
Shigeru Terashima, Utsunomiya, JP;
Mika Kanehira, Sendai, JP;
Masayuki Tanabe, Utsunomiya, JP;
Yutaka Watanabe, Shioya-gun, JP;
Shigeru Terashima, Utsunomiya, JP;
Mika Kanehira, Sendai, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.