The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Mar. 26, 2008
Shigeru Shoji, Tokyo, JP;
Shigeru Shoji, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A thin film capacitor with a trench structure having a base substance and a pair of electrodes provided on the base substance, and a dielectrode provided between the electrodes. The trench pattern is configured to have a first pattern and a second pattern separate from the first pattern. The first pattern having a plurality of protrusions provided upright at predetermined intervals, and the second pattern separate from the first pattern having a plurality of recesses provided at predetermined intervals, are provided at the side of the base substance where the dielectric film is formed. Trenches are each defined by the outer wall of each protrusion and the inner wall of each recess.