The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2011

Filed:

Oct. 17, 2007
Applicant:

Robert Andrew Marshall, Georgetown, TX (US);

Inventor:

Robert Andrew Marshall, Georgetown, TX (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for holographic lithography is disclosed, including interferometeric alignment of laser sources. This includes creation of the volumetric holographic pattern around wire and other planar and non-planar substrates. This template is further processed into devices for various applications including Photonic Crystals, Photonic Band Gaps, Photonic Band Gaps with selective defects, and Photonic Band Gap incandescent emitters.


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