The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Dec. 18, 2008
Seokwoo Lee, Bucheon-si, KR;
Suhyuk Kang, Seoul, KR;
Seokwoo Lee, Bucheon-si, KR;
Suhyuk Kang, Seoul, KR;
LG. Display Co. Ltd., Seoul, KR;
Abstract
A method for manufacturing a display device includes forming an active layer by performing an SPC (solid phase crystallization) process on a first substrate; forming a cushioning layer of amorphous silicon (a-Si) on the active layer under an atmosphere containing about 90 to about 97% by flow rate of hydrogen (H2) and about 10 to about 3% by flow rate of silane (SiH4); forming an N-type impurity layer on the cushioning layer; forming a metal layer to cover the N-type impurity layer; forming a source and drain by removing the metal film by a first etching method; and separating the N-type impurity layer and the cushioning layer by a second etching method.