The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2011

Filed:

Apr. 23, 2008
Applicants:

Thomas Dean Milster, Tucson, AZ (US);

Sang-ki Park, Tucson, AZ (US);

Inventors:

Thomas Dean Milster, Tucson, AZ (US);

Sang-Ki Park, Tucson, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical medium including a plurality of data layers stacked relative to each other in a dielectric medium. A respective data layer including mark and land regions for having information recorded thereon. A mark region and a land region in the respective data layer are disposed beside each other and have substantially the same optical path length across respective thicknesses of the mark region and the land region. A method and computer program product associated with forming the optical medium which determines whether an admittance curve for a material to be used as the mark region forms an intersection with a desired admittance curve based on the admittance of a land region disposed beside the mark region, and determines a thickness of the material based on the intersection.


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