The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Jun. 10, 2005
Hanns-peter Popp, Berg, DE;
Rainer Nicolai, Basel, CH;
Hartwig Rauleder, Rheinfelden, DE;
Jürgen Lang, Karlsruhe, DE;
Hanns-Peter Popp, Berg, DE;
Rainer Nicolai, Basel, CH;
Hartwig Rauleder, Rheinfelden, DE;
Jürgen Lang, Karlsruhe, DE;
Evonik Degussa GmbH, Essen, DE;
Abstract
The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (or) which is connected via a connecting line with the inlet of the reactor (or) with control unit (or) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor () to a condensation unit (or) with downstream collection vessel (or) which is connected via an offtake line (or) to a distillation unit (or) and, if appropriate, is equipped with a feed line () to the unit ().