The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Jul. 12, 2007
Jeanne E. Haubrich, Clifton Park, NY (US);
Yi-shung Chaug, Cupertino, CA (US);
Zarng-arh George Wu, San Diego, CA (US);
Rong-chang Liang, Cupertino, CA (US);
Xiaojia Wang, Fremont, CA (US);
Jeanne E. Haubrich, Clifton Park, NY (US);
Yi-Shung Chaug, Cupertino, CA (US);
Zarng-Arh George Wu, San Diego, CA (US);
Rong-Chang Liang, Cupertino, CA (US);
Xiaojia Wang, Fremont, CA (US);
SiPix Imaging, Inc., Fremont, CA (US);
Etansi Inc., Chung-Li, Taoyuan County, TW;
Abstract
A process for forming a patterned thin film structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired thin film structures will be formed in the areas where the printed material is not present, i.e., a negative image of thin film structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired thin film structures will be formed in the areas where the printed material is present, i.e., a positive image of the thin film structure is printed. The thin film material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned thin film structures.