The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Feb. 26, 2009
Laurence Warden, Poway, CA (US);
Andreas W. Dreher, Escondido, CA (US);
John Ferro, Santa Rosa, CA (US);
Jagdish M. Jethmalani, San Diego, CA (US);
Shui T. Lai, Encinitas, CA (US);
Laurence Warden, Poway, CA (US);
Andreas W. Dreher, Escondido, CA (US);
John Ferro, Santa Rosa, CA (US);
Jagdish M. Jethmalani, San Diego, CA (US);
Shui T. Lai, Encinitas, CA (US);
Ophthonix, Inc., Vista, CA (US);
Abstract
A system for manufacturing an optical lens that is configured to correct optical aberrations, including, e.g., high order aberrations such as described by Zernike polynomials. The system can include a measurement system configured to measure optical aberrations in a patient's eye and to create measured optical aberration data. A calculation system is configured to receive the measured optical aberration data and to determine a lens definition based on the measured optical aberration data. A fabrication system is configured to produce a correcting lens based on the lens definition.