The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2011

Filed:

Jan. 16, 2007
Applicants:

Atsushi Yamaguchi, Tokyo, JP;

Kei Hirata, Tokyo, JP;

Satoshi Miura, Tokyo, JP;

Yoshihiro Tsuchiya, Tokyo, JP;

Kiyoshi Noguchi, Tokyo, JP;

Inventors:

Atsushi Yamaguchi, Tokyo, JP;

Kei Hirata, Tokyo, JP;

Satoshi Miura, Tokyo, JP;

Yoshihiro Tsuchiya, Tokyo, JP;

Kiyoshi Noguchi, Tokyo, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/39 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magneto-resistive element includes a lower magnetic shield film and a magneto-resistive film disposed above the lower magnetic shield film. The lower magnetic shield film includes a lower shield layer and an upper shield layer. The upper shield layer is amorphous or microcrystalline, made of a NiFe or CoFe composition containing B or P, and deposited on the lower shield layer. The lower shield layer is a magnetic conductive layer which is amorphous or microcrystalline with a crystal grain size equal to or less than 20 nm.


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