The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2011

Filed:

May. 31, 2005
Applicants:

Joe G. Tran, Flower Mound, TX (US);

Brian K. Kirkpatrick, Allen, TX (US);

Alfred J. Griffin, Jr., Dallas, TX (US);

Inventors:

Joe G. Tran, Flower Mound, TX (US);

Brian K. Kirkpatrick, Allen, TX (US);

Alfred J. Griffin, Jr., Dallas, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system () removes wafer edge residue from a target wafer (). A wafer holding mechanism () holds and rotates the target wafer (). A residue remover mechanism () mechanically interacts or abrades an edge surface of the target wafer () and removes strongly adhered residue from the edge surface of the target wafer (). The residue remover mechanism () controls coverage of the mechanical interaction and magnitude of the mechanical interaction.


Find Patent Forward Citations

Tran, Joe. (2011). Systems and methods for removing wafer edge residue and debris using a residue remover mechanism (U.S. Patent No. 7998865). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7998865

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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