The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Mar. 14, 2008
Hae-sung Kim, Hwaseong-si, KR;
Myung-bok Lee, Suwon-si, KR;
Jin-seung Sohn, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having a structure in which line patterns are repeatedly arranged with a predetermined interval; (b) irradiating light onto a surface of the metal layer to excite surface plasmon so that the photoresist layer is exposed to a second pattern by the surface plasmon; (c) removing the metal layer and developing the photoresist layer; and (d) etching the etching object material layer using the photoresist layer patterned to the second pattern as a mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile