The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Jun. 04, 2009
Chikaaki Kodama, Kanagawa-ken, JP;
Hirotaka Ichikawa, Kanagawa-ken, JP;
Kazuyuki Masukawa, Kanagawa-ken, JP;
Toshiya Kotani, Tokyo, JP;
Chikaaki Kodama, Kanagawa-ken, JP;
Hirotaka Ichikawa, Kanagawa-ken, JP;
Kazuyuki Masukawa, Kanagawa-ken, JP;
Toshiya Kotani, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A mask pattern data creation method includes: determining whether or not a spacing of adjacent assist pattern feature data is not more than a prescribed spacing, based on: initial position data indicating an initially set position of the assist pattern feature data determined based on an illumination condition; and initial size data indicating an initially set size of the assist pattern feature data satisfying a size condition to not optically form an image on the transfer destination; and moving at least one of the adjacent assist pattern feature data or reducing a size of the at least one to increase the spacing of the assist pattern feature data to exceed a prescribed spacing in the case where it is determined that the spacing of the assist pattern feature data is not more than the prescribed spacing.