The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Jun. 30, 2007
Applicants:
Calvin K. LI, Fremont, CA (US);
Yung-tin Chen, Santa Clara, CA (US);
En-hsing Chen, Fremont, CA (US);
Paul Wai Kie Poon, Fremont, CA (US);
Inventors:
Calvin K. Li, Fremont, CA (US);
Yung-Tin Chen, Santa Clara, CA (US);
En-Hsing Chen, Fremont, CA (US);
Paul Wai Kie Poon, Fremont, CA (US);
Assignee:
SanDisk Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mask is reused to form the same pattern in multiple layers in semiconductor processing. Reference marks that allow alignment accuracy to be checked are also formed with the mask. The manner of using the mask advantageously mitigates interference between reference marks in different layers.