The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Nov. 30, 2004
Philippe Maquin, St Jean de Sixt, FR;
Thierry Neel, Meythet, FR;
Roland Bernard, Viuz-la-Chiesaz, FR;
Philippe Maquin, St Jean de Sixt, FR;
Thierry Neel, Meythet, FR;
Roland Bernard, Viuz-la-Chiesaz, FR;
Alcatel, Paris, FR;
Abstract
A pumping system comprising at least one pump unit () with a vacuum pump casing in which there are multiple pumping stages that includes at least one pumped gas treatment system is provided. The pumped gas treatment system compromises at least one plasma source located inside the vacuum pump casing of the pump unit, to generate a plasma that at least partially decomposes certain gases passing through the pump unit. This reduces the size of the pumped gas treatment system and improves its efficiency so that a gas pumping and treatment system can be created that is sufficiently small as to allow it to be placed in close proximity to the process chambers.