The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
May. 21, 2008
Barry G. Broome, Carlsbad, CA (US);
Thomas R. Myers, Palo Alto, CA (US);
Leonard C. Debenedictis, Palo Alto, CA (US);
David A. Dewey, Sunnyvale, CA (US);
Barry G. Broome, Carlsbad, CA (US);
Thomas R. Myers, Palo Alto, CA (US);
Leonard C. DeBenedictis, Palo Alto, CA (US);
David A. Dewey, Sunnyvale, CA (US);
Reliant Technologies, Inc., Mountain View, CA (US);
Abstract
An optical pattern generator uses a rotating component that includes a number of deflection sectors containing optical elements. Each sector deflects an incident optical beam by a substantially constant angle although this angle may vary from one sector to the next. The constant deflection angle is achieved by symmetry within the deflection sector, specifically gut-ray symmetry. The rotating component may be combined with an imaging group that produces, for example, image points, spots, or lines displaced along a line locus. The image spots can also be displaced to either side of a line, for example by introducing a tilt in the orthogonal direction or by introducing light beams at various angles to the plane of symmetry.