The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Dec. 09, 2005
Changhan Kim, Madison, WI (US);
Franco Cerrina, Madison, WI (US);
Changhan Kim, Madison, WI (US);
Franco Cerrina, Madison, WI (US);
Wisconsin Alumni Research Foundation, Madison, WI (US);
Abstract
A prepared substrate upon which light directed DNA synthesis is to occur is exposed to light via an inverse mask pattern to deprotect inactive regions of the substrate where the synthesis is not intended to occur. The deprotected sites are then capped to disable permanently the inactive areas, thereby forming an inverse capped substrate. Unwanted DNA synthesis in the inactive areas is thus prevented, resulting in purer quality DNA, even though such areas may be exposed to light due to diffraction, scattering and flare during subsequent DNA synthesis of the intended active areas of the substrate.