The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Dec. 30, 2009
Hyeong-ho Park, Daejeon, KR;
Dae-geun Choi, Daejeon, KR;
Jun-ho Jeong, Daejeon, KR;
Ki-don Kim, Seoul, KR;
Jun-hyuk Choi, Daejeon, KR;
Ji-hye Lee, Daejeon, KR;
Seong-je Park, Daejeon, KR;
So-hee Jeon, Seoul, KR;
Sa-rah Kim, Daejeon, KR;
Hyeong-Ho Park, Daejeon, KR;
Dae-Geun Choi, Daejeon, KR;
Jun-Ho Jeong, Daejeon, KR;
Ki-Don Kim, Seoul, KR;
Jun-Hyuk Choi, Daejeon, KR;
Ji-Hye Lee, Daejeon, KR;
Seong-Je Park, Daejeon, KR;
So-Hee Jeon, Seoul, KR;
Sa-Rah Kim, Daejeon, KR;
Korea Institute of Machinery & Materials, Jang-Dong, Yuseong-Ku, Daejon, KR;
Abstract
A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.