The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Oct. 10, 2008
Jene A. Golovchenko, Lexington, MA (US);
Gavin M. King, Boulder, CO (US);
Gregor M. Schurmann, Neuchatel, CH;
Daniel Branton, Lexington, MA (US);
Jene A. Golovchenko, Lexington, MA (US);
Gavin M. King, Boulder, CO (US);
Gregor M. Schurmann, Neuchatel, CH;
Daniel Branton, Lexington, MA (US);
President and Fellows of Harvard College, Cambridge, MA (US);
Abstract
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.